Australia's Hardware Sensing Δ 5th of January 2014 Ω 1:46 PM

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~ Semiconductor Nanofabrication Facility of AFNN ~ sense for Ξ ~ sense for Ξ	~ sense for Ξ ~ sense for Ξ ~ sense for Ξ	~ sense for Ξ ~ sense for Ξ ~ sense for Ξ
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«Hardware Sensing	Θ	Θ
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~ Semiconductor Nanofabrication Facility of AFNN

Semiconductor Nanofabrication Facility of AFNN

Specific capabilities
ξ electron-beam lithography for large area structures, especially in nanoelectronics;
ξ ultra-high resolution EBL for small scale prototype devices; and semiconductor device prototyping.

Nanoelectronics
ξ is a critical enabling technology for a range of existing and developing industries
ξ all modern-day computer processor chips are based on transistors with component sizes below 100 nanometers (500 times smaller than the width of a human hair)
ξ the development of new transistors, molecular electronics and other innovative device concepts relies on the ability to fabricate prototype devices on the nanoscale
ξ electron beam lithography (EBL) uses a highly focused beam of electrons to "write" such circuits at this tiny scale.
ξ Its flexibility allows for new concepts to be tested on a fast timescale and
ξ it is therefore a key tool in any nanoelectronics research laboratory.

ξ The ANFF NSW node is hosted within the Semiconductor Nanofabrication Facility (SNF) at UNSW.
ξ Established in 1995, the SNF houses clean-room laboratories containing a comprehensive collection of micro-electronic and
ξ nano-electronic process equipment for fabricating an array of silicon (Si) and gallium arsenide (GaAs) devices.
ξ The laboratory currently supports ground-breaking research in
ξ silicon quantum computing,
ξ quantum electronic devices,
ξ medical radiation detectors and
ξ photovoltaics.

ξ The node builds on its existing concentration of EBL systems and expertise in advanced nanoelectronics.
ξ During its 13 years of operation, SNF staff have developed significant knowledge and expertise in EBL process development and advanced lithography tool operation.
ξ The node will offer users the training required to fabricate complete devices, involving complex and advanced process flows.

ARC Centre of Excellence for Quantum Computing Technology, UNSW
ξ The node provides a full device prototyping service including:
ξ device design and conception,
ξ photo-mask design,
ξ photo-mask fabrication (at the Bandwidth Foundry LINK) and process development.

ξ Leading edge nano-photonic and nano-electronic applications demand high-resolution EBL over large areas (millimetres).
ξ The NCRIS program has enabled the purchase of a RAITH-150TWO EBL tool.
ξ This system allows fabrication of nanoscale structures (with feature sizes down to 20nm) over very large areas, up to 400 mm in size.
ξ Examples of structures that can be fabricated using this tool include holographic plates and photonic crystals.
ξ The RAITH-150TWO, together with a number of other essential microfabrication facilities,
ξ will come on-line in new purpose-built class 35 and class 350 clean-rooms in the third quarter of 2008.

ξ NCRIS funding has also enabled the appointment for 3 additional technical staff
ξ with specific expertise in lithography, photo-mask design and semiconductor processing.

Contact Details
ξ Node Director: Prof. Andrew Dzurak Email: a.dzurak@unsw.edu.au Phone: +61 2 9385 6311

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